Electromechanical devices and methods for fabrication of the same

ABSTRACT

A fabricated electromechanical device is disclosed herein. An exemplary device includes, a substrate, at least one layer of a high-transconductance material separated from the substrate by a dielectric medium, a first electrode in electrical contact with the at least one layer of a high-transconductance material and separated from the substrate by at least one first supporting member, a second electrode in electrical contact with the layer of a high-transconductance material and separated from the substrate by at least one second supporting member, where the first electrode is electrically separate from the second electrode, and a third electrode separated from the at least one layer of high-transconductance material by a dielectric medium and separated from each of the first electrode and the second electrode by a dielectric medium.

CROSS REFERENCE TO RELATED APPLICATIONS

This is a divisional application of U.S. patent application Ser. No.13/149,415 filed May 31, 2011, which is a continuation-in-partapplication of International Patent Application PCT/US2009/066217,entitled “Electromechanical Devices And Methods For Fabrication Of TheSame,” filed Dec. 1, 2009, which claims priority to U.S. ProvisionalApplication No. 61/118,919, entitled “Three-Terminal Device UsingMechanically-Vibrating, High-transconductance Material,” filed on Dec.1, 2008, the disclosure of each of which is incorporated by reference inits entirety herein.

STATEMENT REGARDING FEDERALLY-SPONSORED RESEARCH

This invention was made with government support under CHE-0117752awarded by the National Science Foundation and HR0011-06-1-0048 awardedby the Department of Defense. The government has certain rights in theinvention.

BACKGROUND

1. Field

The present application relates to mechanically-vibrating,high-transconductance devices and methods for fabricating the same.

2. Background Art

Electromechanical devices have numerous applications across many fieldsof art and such devices can be utilized for creating oscillators,resonators, mass sensors, force sensors, position sensors,accelerometers and switches, just to name a few. Furthermore, it isdesirable to create small devices, on the order of microns ornanometers. Such devices are often referred to as microelectromechanicaldevices (MEMS) or nanoelectromechanical devices (NEMS). However, in manyapplications it can be extremely difficult to fabricate such devices dueto the very small scales involved.

Graphene, is famed in a hexagonal lattice of sp²-hybridized carbonatoms. One property of graphene is that it allows for the etching ofsilicon dioxide from underneath a graphene layer placed on the surfaceof the silicon dioxide. Further, the etching process is acceleratedunderneath the graphene and it has also been found that graphene is notpermeable to some etchants, such as hydrofluoric acid. Graphene has alsobeen found to have other beneficial properties such as high stiffness,low mass density and high transconductance, making it an ideal materialfor use in MEMS or NEMS device application and also in fundamentalstudies of small scale mechanics.

Accordingly, there is a need in the art for fabricated electromechanicaldevices that make use of the high transconductance and other propertiesof graphene and for techniques for fabricating the same.

SUMMARY

A fabricated electromechanical device is disclosed herein. An exemplarydevice includes, a substrate, at least one layer of ahigh-transconductance material separated from the substrate by adielectric medium, a first electrode in electrical contact with the atleast one layer of a high-transconductance material and separated fromthe substrate by at least one first supporting member, a secondelectrode in electrical contact with the layer of ahigh-transconductance material and separated from the substrate by atleast one second supporting member, where the first electrode iselectrically separate from the second electrode, and a third electrodeseparated from the at least one layer of high-transconductance materialby a dielectric medium and separated from each of the first electrodeand the second electrode by a dielectric medium.

In some embodiments, the substrate can include the third electrode andin other embodiments, the third electrode can be a localized electrodedeposited on the substrate. The third electrode can also be a localizedelectrode submerged into the substrate. Further, thehigh-transconductance material can be graphene and the dielectric mediumcan be either air or a vacuum. In the same or yet other embodiments, thesubstrate can be silicon. In some embodiments, the first, second orthird electrodes can be metal electrodes and can further be goldelectrodes. The at least one first supporting member or the at least onesecond supporting member can be silicon dioxide.

One exemplary fabricated electromechanical device can further includecircuitry including a first voltage source electrically connected to thefirst electrode, a second voltage source electrically connected to thesecond electrode, a third voltage source electrically connected to thethird electrode, where the first voltage source is electricallyconnected to the third voltage source, and a first capacitorelectrically connected between the first voltage and the third voltagesource. In the same or another embodiment, the fabricatedelectromechanical device can further include a first inductorelectrically connected between the first voltage source and the firstelectrode, a second inductor electrically connected between the secondvoltage source and the second electrodes, and a third inductorelectrically connected between the third voltage source and the thirdelectrode.

The fabricated electromechanical can also include a second capacitorelectrically connected between the second voltage source and the secondelectrode and further electrically connected to a ground. It can furtherinclude a third capacitor connected between the first voltage source andthe first electrode, where the third capacitor is further electricallyconnected, in series, to a first resistor and a ground and, in someembodiments, it can include a second resistor electrically connectedbetween the first capacitor and the third electrode and furtherelectrically connected to a ground. In same or other embodiments, thefabricated electromechanical device can include a directional couplerelectrically connected between the first capacitor and the thirdelectrode and further electrically connected to an electrical readingdevice.

In one exemplary embodiment, the fabricated electromechanical device canfurther include circuitry which includes, a first voltage sourceelectrically connected to a power splitter, a first capacitorelectrically connected between the power splitter and the secondelectrode, a second voltage source electrically connected between thefirst capacitor and the second electrode, a first current amplifierelectrically connected to the first electrode, a second currentamplifier electrically connected to the first current amplifier, afrequency mixer electrically connected to the second current amplifierand the high frequency voltage source, a second capacitor electricallyconnected between the high frequency mixer and the third electrode, anda third voltage source electrically connected between the secondcapacitor and the third electrode.

In some embodiments, the fabricated electromechanical device furtherincludes, a third capacitor electrically connected between the secondvoltage source and the second electrode, a fourth capacitor electricallyconnected between the first electrode and the current amplifier, and afifth capacitor electrically connected between the third voltage sourceand the third electrode. The device can also include a first inductorelectrically connected between the second voltage source and the secondelectrode, and a second inductor electrically connected between thethird voltage source and the third electrode. Further, in the same orother embodiment, the second current amplifier is operable to provide anoutput.

A method for fabricating an electromechanical device is also disclosedherein. An exemplary method includes, depositing a first layer ofetchable material on a substrate, depositing at least one layer ofgraphene on the etchable material, depositing a first electrode on theetchable material such that at least a first portion of the at least onelayer of graphene is covered by the first electrode and at least aportion of the first electrode is directly in contact with the etchablematerial, depositing a second electrode on the etchable material suchthat at least a second portion of the at least one layer of graphene iscovered by the second electrode and at least a portion of the secondelectrode is directly in contact with the etchable material, andexposing the etchable material to an etchant to remove the etchablematerial around the first and second layers of metal and underneath theat least one layer of graphene, thus fabricating a device having the atleast one layer of graphene suspended above the substrate.

In some embodiments, the method further includes depositing a thirdelectrode on the substrate, which can involve depositing the thirdelectrode on the first layer of etchable material. The method can alsoinclude depositing a second layer of etchable material on the substrateand in some embodiments, it can further include, depositing a thirdelectrode on the first layer of etchable material, where depositing thesecond layer of etchable material on the substrate includes depositingthe second layer of etchable material on the first layer of etchablematerial, where depositing the at least one layer of graphene on theetchable material includes depositing the at least one layer of grapheneon the second layer of etchable material, where depositing the firstelectrode on the etchable material includes depositing the firstelectrode on the second layer of etchable material, and where depositingthe second electrode on the etchable material includes depositing thesecond electrode on the second layer of etchable material.

In same or other embodiments, the method further includes depositing athird electrode on the second layer of etchable material, wheredepositing the at least one layer of graphene on the etchable materialincludes depositing the at least one layer of graphene on the firstlayer of etchable material, where depositing the first electrode on theetchable material includes depositing the first electrode on the firstlayer of etchable material, where depositing the second electrode on theetchable material includes depositing the second electrode on the firstlayer of etchable material, and where depositing the second layer ofetchable material on the substrate includes depositing the second layerof etchable material on the first layer of etchable material.

In some embodiments, the method can also include patterning the at leastone layer of graphene, which can be performed utilizing lithography topattern the deposited layer and/or can be performed utilizing oxygenplasma etching to pattern the at least one layer of graphene. In thesame or other embodiments, exposing the etchable material to an etchantincludes acid vapor phase etching of the etchable material and/orexposing the etchable material to a buffered oxide etchant.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated and constitute part ofthis disclosure, illustrate some embodiments of the disclosed subjectmatter.

FIGS. 1( a)-(e) illustrate side views of various configurations of afabricated electromechanical device in accordance with exemplaryembodiments of the disclosed subject matter.

FIG. 1( f) illustrates a top view of a fabricated electromechanicaldevice in accordance with an exemplary embodiment of the disclosedsubject matter.

FIG. 2( a) illustrates a diagram of circuitry connected to a fabricatedelectromechanical device in accordance with an exemplary embodiment ofthe disclosed subject matter.

FIGS. 2( b)-(g) illustrate additional circuitry connected to afabricated electromechanical device in accordance with exemplaryembodiments of the disclosed subject matter.

FIG. 2( h) depicts a screen shot from a spectrum analyzer for anembodiment of a circuit.

FIG. 3 illustrates a diagram of circuitry connected to a fabricatedelectromechanical device in accordance with an exemplary embodiment ofthe disclosed subject matter.

FIG. 4 illustrates a process for fabricating an electromechanical devicein accordance with an exemplary embodiment of the disclosed subjectmatter.

FIGS. 5( a)-(f) illustrate a process for fabricating anelectromechanical device in accordance with an exemplary embodiment ofthe disclosed subject matter.

FIG. 5( g) is a top-view image of a series of fabricatedelectromechanical devices in accordance with an exemplary embodiment ofthe disclosed subject matter.

FIGS. 6( a)-(f) illustrate a process for fabricating anelectromechanical device in accordance with an exemplary embodiment ofthe disclosed subject matter.

FIG. 6( g) is a side-view image of a fabricated electromechanicaldevices in accordance with an exemplary embodiment of the disclosedsubject matter.

FIG. 6( h) is a top-view image of a series of fabricatedelectromechanical devices in accordance with an exemplary embodiment ofthe disclosed subject matter.

FIGS. 7( a)-(d) illustrate a process for fabricating anelectromechanical device in accordance with an exemplary embodiment ofthe disclosed subject matter.

FIG. 7( e) is a top-view image of a series of fabricatedelectromechanical devices in accordance with an exemplary embodiment ofthe disclosed subject matter.

FIG. 7( f) is a side-view image of the fabricated electromechanicaldevice at point A in FIG. 7( e) in accordance with an exemplaryembodiment of the disclosed subject matter.

FIG. 7( g) is a side-view image of the fabricated electromechanicaldevice at point B in FIG. 7( e) in accordance with an exemplaryembodiment of the disclosed subject matter.

FIG. 7( h) illustrates a fabricated electromechanical device inaccordance with an exemplary embodiment of the disclosed subject matter.

FIG. 8( a) illustrates a perspective view of a configurations of afabricated electromechanical device in accordance with one embodiment ofthe disclosed subject matter.

FIG. 8( b)-(c) are SEM micrographs of a fabricated electromechanicaldevice as illustrated in FIG. 8( a).

Throughout the figures and specification the same reference numerals areused to indicate similar features and/or structures.

DETAILED DESCRIPTION

The techniques described herein are useful for fabricating micro- andnanoelectromechanical devices. Although the description is focused onoscillators, the techniques herein can also be useful for producingother devices, such as resonators, mass sensors, force sensors, positionsensors, accelerometers and switches.

The subjected matter disclosed herein provides for fabricated micro- andnanoelectromechanical devices, the techniques for fabricating suchdevices and the associated circuitry for particular applications. Thetechniques described herein make use of the properties of certainhigh-transconductance materials, particularly for the example ofmonolayer graphene, to produce fabricated devices having a layer ofgraphene suspended from two electrodes. High transconductance materialshave transconductance values of approximately 100 nS (nano-siemens) orgreater, with graphene and carbon nanotubes able to achieve as much as7-8 μS. Devices fabricated according to the disclosed subject matterwere found to have a transconducance in the range 100 nS to 1 μS. Byfurther including a gate electrode and the appropriate circuitry, asdiscussed in detail below, the suspended graphene sheet can be inducedto vibrate. Such vibration can be detected using the circuitry, as canany alterations in such vibration due to, for example, a change in themass of the graphene layer caused the deposition of some particles,e.g., the vibrating graphene sheet can act as a mass sensor. Anotherexemplary use of such fabricated devices could be as clocks, since thegraphene sheet will have a definite resonance frequency based on itsparticular characteristics such as width, length and the applied voltageto the gate electrode.

FIG. 1( a) illustrates a fabricated electromechanical device 100including a first electrode 101 and a second electrode 104, each ofwhich can be metal electrodes. First and second electrodes 101, 104 canalso comprise a layer of metal, e.g., gold, deposited on another layerof a different metal, e.g., chromium, for the purpose of providing anadhesive surface for the gold layer. The first and second electrodes101, 104 can be formed from any metal appropriate for use in thesemiconductor arts, such as gold, aluminum, copper, titanium, etc. Insome exemplary embodiments, the first and second electrodes 101, 104 canhave a thickness of, for example, 5-1000 nm, though for someapplications even thicker electrodes can be used. The electrodethickness can, in some embodiments, dependent on the thickness of theresist and the type mask used for depositing the electrodes 101, 104,the etching layer that will form the supporting members 102, 105, thedesired size of various features on the surface of the substrate 107(e.g., supporting members 102, 105), the amount of the substrate 107surface to be covered and conductivity of the substance used to formelectrodes 101, 104. In some embodiments, a electron beam resist thatallows for printing lines as narrow as 10 nm between electrodes 101, 104can be used and such resists can have no practical limit on the lengthof the electrodes 101, 104 running in the direction along the electrodeedge. Further in some exemplary embodiments, the electrodes 101, 104thickness will not exceed that of the resist or that of the featureunderneath electrodes 101, 104 (e.g., supporting members 102, 105) toreduce the risk of not being able to remove the sacrificial layer (e.g.,the etchable layer used to form supporting members 102, 105) due tobridging of the electrodes 101, 104 across the resist gap. Additionally,if metal film coverage is uniform down to a few nanometers thickness, afactor to considered in selecting a thickness becomes the conductivityof the metal chosen for the electrode. Gold can be fairly conductiverelative to the graphene down to thicknesses as little as 5 nm, butcopper and aluminum are known to oxidize substantially within a fewnanometers from the surface, which could render the electrodesinsulating at these thicknesses.

The planar dimensions of the first and second electrodes 101, 104 can beselected based on the particular application of fabricated device 100,and can be, for example, on the order of 10 nm-10 μm, or in someembodiments, can be 10-500 nm. In one exemplary embodiment, theelectrodes 101, 104 act as a mask during the wet etching process(described in detail below) and due to the isotropic nature of thesacrificial layer, e.g., silicon dioxide, the etching will undercut thesacrificial layer that becomes supporting members 102, 105 for adistance (in the x, y plane) that is close to or the same as the depthof the etching. Thus, the lower limit for the planar (e.g., x, y)dimensions for electrodes 101, 104 should be at least as large as theetching depth, which in some embodiments can be on the order of hundredsof nanometers, e.g., 100-500 nm or in one embodiment 200 nm. The upperlimit for the planar (e.g., x, y) dimensions for electrodes 101, 104 canbe set as any value desired by the lithography process, and in someembodiments can be on the order of several microns, e.g., 1-10 μm.

Fabricated electromechanical device 100 further includes a substrate107, which in some exemplary embodiments includes silicon, though othermaterials such as quartz, glass, or indium tin oxide (ITO) can be used.In one exemplary embodiment, the substrate must be resistive enough athigh frequencies to block signal loss due to cross-coupling of signalsfrom the electrodes to the substrate underneath. Good low-frequencyconductivity can be desirable for additional fine-tuning of the devices'properties, which can be a reason why resistive silicon substrates areideal in some embodiments. Substrate 107 can be formed to any dimensionsappropriate for a particular applicant and in some exemplary embodimentscan have a thickness in the range of 500 microns to 1 mm, though thickersubstrates 107 can also be used. Commercially available wafers 107 withdiameters of 100 mm can have thicknesses between 500 and 700 microns.Larger wafers, e.g., 300 mm diameter wafers, can have thicknesses in the700-800 micron range. Further, in some embodiments, substrate 107 caninclude layers of more than one type of material, e.g., a silicon baselayer and a silicon dioxide surface layer.

Each of the first and second electrodes 101, 104 are supported on thesubstrate 107 by supporting members 102, 105, respectively, which insome exemplary embodiments can be composed of silicon dioxide. Each ofsupporting members 102, 105 can be composed of one or more partsdepending on the configuration prior to fabrication: for example, FIG.1( f) is a top view of an exemplary device where each supporting member102, 105 is composed of two separate parts. In some embodiments,supporting members 102, 105 can be 10 nm-10 μm thick, and in oneembodiment, supporting members 102, 105 can be 50-500 nm thick. In oneembodiment there is no practical limit to how thick the sacrificiallayer that is the basis for the supporting member 102, 105 can be,except by the exponential oxidation process that is employed to oxidizethe wafer 107, and can be used to oxidize the whole wafer in someembodiments. In the same or another embodiment, the thinnest sacrificialoxide layer used to form supporting members 102, 105 can be 20 nm thick.A 300 nm oxide layer can be advantageous for spotting the exfoliatedgraphene optically due to absorption contrast.

A high-transconductance material 103 is suspended between electrodes101, 104, and in an exemplary embodiment includes one or more layers ofgraphene. The high-transconductance material 103 should be in electricalcontact with each of the first and second electrodes 101, 104. In oneexemplary embodiment, such electrical contact can be by direct contactwith a conducting layer of electrodes 101, 104, or a conducting layer incontact with electrodes 101, 104. In an alternative embodiment, suchelectrical contact can be by indirect contact with electrodes 101, 104,by, for example, being in contact with a semiconducting layer betweenelectrodes 101, 104 and the high-transconductance material 103. In thesame or other embodiments, the electrical contact betweenhigh-transconductance material 103 and electrodes 101, 104 can benon-linear. Further, the electrical contact should be of sufficientlylow resistance such that some non-negligible current can cross thehigh-transconductance material 103.

The high-transconductance material 103 is separated from the substrate107 by a dielectric medium, such as air or a vacuum. In one embodiment,the high-transconductance material 103 includes a single sheet, orribbon, of monolayer graphene, e.g., a sheet of graphene having a singleatomic thickness, suspended between electrodes 101, 104. The presentlydisclosed subject matter also envisions the use of suspended multiplelayered sheets of graphene 103, e.g., 2-30 layers or in some embodimentup to 10 nm thick. Thickness beyond 30 layers, or 10 nm graphenethickness, can result in electrostatic screening from the layers closerto the substrate 107 which can lower the transconductance to a pointwhere the resonances cease to give out significant signal and can bedifficult to detected further. Chemical vapor deposition techniques usedto deposit the graphene 103, in one exemplary embodiment, canconsistently provide large coverage for up to 3 layers of graphene(which is approximately 1 nm in thickness) and at the same time stillprovide for a fairly high transconductance. The planar dimensions (e.g.,the (x, y) dimensions along the substrate plane) of thehigh-transconductance material (e.g., graphene) 103 can be selected forthe particular application of fabricated device 100 and in one exemplaryembodiment, graphene 103 can be patterned into a sheet.

Fabricated electromechanical device 100 further includes a thirdelectrode 106, which in the exemplary embodiment illustrated in FIG. 1(a) can be deposited on the surface of substrate 107. The third electrode106 can be composed of metal, e.g., gold, in some embodiments and canalso include a layer of another metal, e.g., chromium, to assist inadhering the gold layer to the substrate 107. Similar to the first andsecond electrodes 101, 104, the third electrode 106 can be formed fromany metal appropriate for use in the semiconductor arts, such as gold,aluminum, copper, titanium, etc. In some exemplary embodiments, thethird electrode 106 can have a thickness of, for example, 5-1000 nm,though for some applications even thicker electrodes can be used. In anexemplary embodiment where the third electrode is a bottom local gateelectrode (e.g., 106 in FIG. 1( a)), there can be a second sacrificiallayer deposition on top of the third electrode, thus too thick aelectrode could produce uneven surface (e.g., a “bump”) in the surfaceof the second sacrificial layer. On the other hand, too thin a electrodecould limit the electrical conductivity, thus, 10 nm to 30 nm can beideal for such an exemplary embodiment, and a 20 nm thick layer ofchromium and gold has been experimentally demonstrated. For top localgate electrode 106 configuration (e.g., FIG. 1( c)), the upper limit canbe similar to the first and second electrodes 101, 104, and the lowerlimit can be determined based on the mechanical stability and electricalconductivity, and in one exemplary embodiment a 20 nm thick layer ofchromium and gold was also experimentally verified, though layers asthin as 5 nm can be possible.

The planar dimensions (e.g., the (x, y) dimensions along the substrateplane) of the third electrode can be selected based on the particularapplication of fabricated device 100, and can be, for example, on theorder of 10 nm-10 μm, or in some embodiments, can be 10-500 nm. The sameconsiderations regarding the planar dimensions of the first and secondelectrodes 101, 104, as discussed above, can be applicable to the thirdelectrode 106. In the exemplary embodiment illustrated in FIG. 1( a) thethird electrode 106 can be referred to as a local gate electrode, thefirst electrode 101 can be the source electrode and the second electrode104 can be the drain electrode. Further, in the embodiment of FIG. 1( a)the dimensions of the third electrode 106 can be selected based on thedimensions of the first and second electrodes 101, 104 and thedimensions of the graphene layer 103, such that the third electrode 106is located between supporting members 102, 105. In addition, the thirdelectrode 106 is also separated from the high-transconductance material103 by a dielectric medium, such as air or a vacuum.

FIG. 1( b) illustrates an exemplary fabricated electromechanical device110 similar to that shown in FIG. 1( a), except that the third electrode106 is submerged in the substrate 107. FIG. 1( c) illustrates anexemplary fabricated electromechanical device 120 that is also similarto that shown in FIG. 1( a), except that the third electrode 106 issuspended above the high-transconductance layer 103 and is furthersupported by supporting member 108, which has sufficient height toseparate the high-transconductance layer 103 from the third electrode106, and in some embodiments can have a thickness range similar to thatof supporting members 102, 105, except that it must be high enough toseparate the third electrode from the graphene 103. FIG. 1( d)illustrates an exemplary fabricated device 130 where the third electrode106 is a global gate electrode comprising a layer of metal, e.g., goldor gold layered upon chromium or other appropriate metals, which has bedeposited across the entire surface of the substrate 107.

FIG. 1( e) illustrates an exemplary fabricated electromechanical device140, where the third electrode 106 and the substrate 107 are the same,e.g., the substrate 107 acts as the third electrode 106. In an exemplaryembodiment illustrated in FIG. 1( e), the substrate 107 can be siliconor other known semiconductive substrates such as quartz, glass, orindium tin oxide (ITO) can be used, which can appropriately function asa gate electrode 106. FIG. 1( f) is a top view of an exemplaryfabricated device 100, illustrating that the fabrication process,discussed in detail below, has resulted in the high-transconductance(e.g., graphene) layer 103 being suspended from each of the electrodes101, 104, which are supported by the support structures 102, 105.

FIG. 2( a) illustrates circuitry 200 connected to a fabricated device201, for example any one of the fabricated devices 100, 110, 120, 130 or140 illustrated in FIGS. 1( a)-(f). As illustrated in FIG. 2( a)circuitry 200 includes a first voltage source V_(SS), which in oneexemplary embodiment is the source voltage for circuitry 200,electrically connected to the first electrode 101, which in oneexemplary embodiment is the source electrode S. The first voltage sourceV_(SS) can be, in some embodiments, a direct current (DC) voltagesource, which in other embodiments V_(SS) can be configured to provideDC or alternating current (AC), depending on the needs of a particularapplication. In one embodiment, V_(SS) is a DC source. Circuitry 200further includes a second voltage source V_(DD), which in one exemplaryembodiment is the drain voltage for circuitry 200, electricallyconnected to the second electrode 104, which in one exemplary embodimentis the drain electrode D. Similar to V_(SS), second voltage sourceV_(DD) can provide either a DC or AC source. In one embodiment thesecond (drain) electrode 104 and first (source) electrode 101illustrated in FIG. 2( a) can be exchanged for one another.

Circuitry 200 further includes a third voltage source V_(G), which inone exemplary embodiment is the gate voltage for circuitry 200,electrically connected to the third electrode 106, which in oneexemplary embodiment is the gate electrode G. As with the first andsecond voltage sources V_(SS), V_(DD), the third voltage source V_(G)can provide either a DC or AC source. As further illustrated in FIG. 2(a), the first voltage source V_(SS) is electrically connected to thethird electrode 106 and there is a first capacitor 204 electricallyconnected between the first voltage source V_(SS) and the thirdelectrode 106. The first capacitor 204 can have any appropriatecapacitance depending on the particular application of the fabricateddevice. In one exemplary embodiment the absolute value of the impedanceof the capacitor, defined as

${Z = \frac{1}{( {2\pi \; {FreqC}} )}},$

should be negligible compared to that of other components in series suchas the graphene 103 in the frequency range of interest. For example, ifthe resonances are located at Freq=100 MHz, and assuming the graphene103 has a real impedance of 1 kΩ, for simplicity, then a ratio ofperhaps 100 to 1 is appropriate. A requirement of Z=10Ωimpedance wouldset the capacitance C˜160 pF as the minimum capacitance allowed at theinput.

In one exemplary embodiment, circuitry 200 can further include a firstinductor 202 electrically connected between the first voltage sourceV_(SS) and the first electrode 101. The first inductor 202 can have anyappropriate inductance depending on the particular application of thefabricated device. In one exemplary embodiment, the impedance absolutevalue of the inductor, defined as Z=(2πFreqL), should be large comparedto that of other components in series such as the graphene in thefrequency range of interest. For example, if the resonances are locatedat Freq=100 MHz, and assuming the graphene has a real impedance of 1 kΩfor simplicity, then a ratio of 100 to 1 can be appropriate in oneexemplary embodiment. A requirement of Z=100 kΩ impedance would setL˜160 μH as the minimum inductance allowed at the input. Circuitry 200can also include a second inductor 203 electrically connected betweenthe second voltage source V_(DD) and the second electrode 104 and athird inductor 205 electrically connected between the third voltagesource V_(G) and the third electrode 106. The second inductor 203 andthird inductor 205 can have any appropriate inductance depending on theparticular application of the fabricated device, and in one exemplaryembodiment, can be determined in the same fashion as the first inductor202. As illustrated in FIG. 2( a), circuitry 200 can also include asecond capacitor 206 electrically connected between the second voltagesource V_(DD) and the second electrode 104 and further electricallyconnected to a ground 207. The second capacitor 206 can have anyappropriate capacitance depending on the particular application of thefabricated device, and in one exemplary embodiment the capacitance ofthe second capacitor 206 can be determined in the same fashion as thefirst capacitor 204.

FIG. 2( b) illustrates additional components that can be included incircuitry 200 at, for example, point a in FIG. 2( a). Such componentscan be included for the purpose of load matching, as is understood inthe art, and can include a third capacitor 208 electrically connectedbetween the first voltage source V_(SS) and the first electrode 101,where the third capacitor 208 is further electrically connected, inseries, to a first resistor 209 and a ground 210. The third capacitor208 can have any appropriate capacitance depending on the particularapplication of the fabricated device, and in one exemplary embodimentthe capacitance of the third capacitor 208 can be determined in the samefashion as the first capacitor 204. The first resistor 209 can have anyappropriate resistance depending on the particular application of thefabricated device, for example, 1-100 kΩ in one exemplary embodiment.The first resistor 209 can be used for converting the current into avoltage and should have a resistance much larger than that of graphene103. In one exemplary embodiment having a 100 to 1 requirement, with thegraphene 103 having a resistance of 1 kΩ, the first resistor 209 wouldhave resistance of 100 kΩ at a minimum. A highly resistive gate, on theother hand, already acts as a current-to-voltage converter, renderingthis option as a way to fine tune the device.

FIG. 2( c) illustrates additional components that can be included incircuitry 200 at, for example, point b in FIG. 2( a). Such componentscan also be included for the purpose of load matching, as is understoodin the art, and can include a second resistor 211 electrically connectedbetween the first capacitor 204 and the third electrode 106 and furtherelectrically connected to a ground 212. The second resistor 211 can haveany appropriate resistance depending on the particular application ofthe fabricated device, and in one exemplary embodiment, the resistanceof the second resistor 211 can be determined in the same manner as thefirst resistor 209, discussed above. In alternative embodiments, theload matching component can take a similar configuration as is depictedin FIG. 2( b), i.e., include both a capacitive element and a resistiveelement in serial connection.

FIG. 2( d) illustrates additional components that can be included incircuitry 200 at, for example, point c in FIG. 2( a). Such componentscan be included for the purpose of determining the frequency ofvibration of the suspended high-transconductance layer 103 and include adirectional coupler 213 electrically connected between the firstcapacitor 204 and the third electrode 106 and further electricallyconnected to an electrical reading device 214, which, in someembodiments, can be a spectrum analyzer which can be capable ofdetermining power versus frequency for the purpose of detecting theresonance. In some embodiments, the directional coupler 213 can be anexternal device that can be used to extract some of the high-frequencypower to a detector (not shown). The directional coupler 213, in oneexemplary embodiment, should be matched to the impedance of thetransmission line attached to it, e.g., 50Ω, work in the frequency rangeof interest, and can extract less than 10% of the power to the detector.

FIG. 2( e) illustrates additional components that can be included incircuitry 200 at, for example, point d in FIG. 2( a). Such componentscan be included for the purpose of electrical signal amplitudeamplification. One example of such components is a high frequencyamplifier 215 with a gain of greater than 1, and operates in a range often to few hundred mega hertz. For example, a Agilent/HP 8447D amplifier(0.1 to 1300 MHz) can be used. Additionally, the amplifier 215 can beused in conjunction with an optional impedance or load matchingcomponent (as depicted in FIG. 2( e) within the box bounded by a dashedline), which can include a capacitor 216 and a resistor 217.

FIG. 2( f) illustrates additional components that can be included incircuitry 200 at, for example, point e in FIG. 2( a). Such componentscan be included for the purpose of electrical signal phase modulation.One example of such components is a high frequency phase shifter 218,with the ability to adjust the phase of incoming high frequencyelectrical signal up to 90 degrees.

It should be understood that the order of the points b, c, d, and e atwhich the various optional components can be attached is generallyarbitrary (except when restricted by practical considerations ifmultiple optional components are used), and not limited to what isdepicted in FIG. 2( a).

FIG. 2( g) illustrates additional components that can be included incircuitry 200 at, for example, point fin FIG. 2( a). One example of suchcomponents is an in-series capacitor 219 for purpose of blocking out DCsignal when other components such as an amplifier, phase shifter, and/ordirectional coupler are included in the circuit. In this case, thecapacitor 219 can be placed closer to the T junction than the pointswhere the other aforementioned optional components are connected.

FIG. 2( h) depicts a screen shot from a spectrum analyzer (describedabove in connection with FIG. 2( d)) for an embodiment of the circuitthat also includes an amplifier 215 at point d and an in-seriescapacitor 219 at pont f. The plot of the screen shot shows theelectrical signal amplitude versus frequency, where the x-axis isfrequency, in unit of MHz, and the y-axis is in unit of dBm, whichrepresents electrical power. The peak around 100 MHz indicates theresonant frequency of a self-sustained oscillation of the circuit as anoscillator. The resonant frequency can be tuned by adjusting the DCvoltages, e.g., by varying the voltage difference between V_(DD) andV_(G) or the difference between V_(SS) and V_(G). Meanwhile, theamplitude of the intrinsic signal of the graphene (as opposed to theexternal amplification coming from an amplifier, e.g., amplifier 215described above) can be tuned by varying the difference between V_(DD)and V_(SS).

FIG. 3 illustrates another exemplary circuitry configuration 300 forfabricated device 301, for example any one of the fabricated devices100, 110, 120, 130 or 140 illustrated in FIGS. 1( a)-(f). Circuitry 300includes a first (e.g., high frequency (HF)) voltage source 302, whichcan be electrically connected to ground 303 and can further be connectedto the second (drain) electrode 104. In an alternative embodiment thesecond (drain) electrode 104 and first (source) electrode 101illustrated in FIG. 3 can be exchanged for one another. In someembodiments, HF voltage source 302 can provide an AC source or a DCsource depending on the particular application, and in an embodiment HFvoltage source 302 provides an AC source as illustrated in FIG. 3 at afrequency range which can be in the range of the resonance frequency ofthe device 100. For example, devices having graphene 103 lengths rangingfrom 500 nm to 3 μm have resonance frequencies in the range of 10-100MHz. Upon DC tuning of the gate voltage V_(g), the resonance can beshifted to the 200 MHz vicinity, though more aggressive DC tuning ispossible. Longer devices (e.g., with longer graphene 103 lengths) havelower resonance frequencies, while shorter devices can have resonancesclose to 1 GHz or larger.

As further illustrated in FIG. 3, a first resistor 304 can beelectrically connected between the HF voltage source 302 and the secondelectrode 104. The first resistor 304 can have any appropriateresistance depending on the particular application of the fabricateddevice, for example, 1-100Ω in one exemplary embodiment. In oneembodiment, resistor 304 can be incorporated into HF source 302 andfurther can have a resistance of 50Ω, which in some embodiments is idealfor delivering a precise HF amplitude to a 50Ω termination through atransmission line with 50Ω characteristic impedance. Most commercial HFsources are matched to 50Ω as a standard.

Circuitry 300 further includes a power splitter 328 that, in oneembodiment, works in the frequency range of HF source 302, and isconnected to the HF source as illustrated in FIG. 3. Power splitter 328can be a −3 dB splitter that divides the power by 50% to each of theoutput lines. Electrically connected between the power splitter 328 andthe second electrode 104 is a first capacitor 327, which can further beconnected to a first inductor 323, which can be connected, in series, toa second resistor 324 and a second voltage source 325 (V_(ds)) and aground 326. Second voltage source 325 (V_(ds)) can be a DC voltagesource in one exemplary embodiment, and second resistor 324 can have aresistance that corresponds to the resistance of the DC voltage source325 (V_(ds)), which in some embodiments can be negligible compared toany resistance that comes after the series, such that the voltage at theoutput is constant. The first capacitor 327 and the first inductor 323together form a bias tee, as is known in the art. Further, firstcapacitor 327 blocks DC from reaching and damaging the HF source 302and, in some embodiments, first capacitor 327 can have negligibleimpedance at the frequency of resonance, while having a large impedanceat the frequency of detection. In one exemplary embodiment the firstcapacitor 327 can have similar properties as the third capacitor 305,which are discussed in more detail below. The inductance of firstinductor 323 can be such that its impedance is negligible at thefrequency of detection (e.g., 1 kHz) and below, providing alow-frequency path to a DC source 325 (V_(sd), usually set to groundduring AC experiments; this path (e.g., 323 to 326) can exist in orderto create a detectable low-frequency current across the device 301), butshould have very large high-frequency impedance compared to the graphene103 at the resonant frequency, otherwise power loss to the graphene 103can result. Also, following the power splitter 328 on each line avoltage attenuator a can be inserted to control the signal amplitudegoing to D (104) and G (106) independently. In addition, another voltageattenuator a can be inserted between the high-frequency mixer 320 andthe second capacitor 319.

Further, circuitry 300 can include a third capacitor 305 electricallyconnected between the HF voltage source 302 and the second electrode104, and the second capacitor 305 can further be electrically connected,in series, to a third resistor 306 and a ground 307. The third capacitor305 can have any appropriate capacitance depending on the particularapplication of the fabricated device. For example and similar to thefirst capacitor 327, third capacitor 305 can have an impedance that isnegligible compared to that of other components in series, especiallythe 50Ω termination to ground, in the frequency range of interest, butcan also be much larger than that of other components in parallel, inparticular the first inductor 323, at the frequency of detection in thelock-in amplifier 321. In some embodiments, the typical detectionfrequencies are 1 kHz, at which frequency a capacitance of 100 nF wouldhave an impedance of 1.6 kOhms, much larger than the typical impedanceof the inductor 323 used (a 1 mH inductor would represent a 6Ω impedanceat 1 kHz, for example); at 100 MHz, that capacitor's impedance reducesto 0.016Ω, negligible compared to the 50 Ohms termination (and to theinductor's impedance as well, which would be 600 kΩ at 100 MHz for the 1mH value). The third resistor 306 can have any appropriate resistancedepending on the particular application of the fabricated device, forexample, 1-100Ω in one exemplary embodiment. In one embodiment, theresistance of the third resistor 306 matches that of the first resistor304, e.g., 50Ω; in such an embodiment, it is necessary that theresistance match in order to reduce power reflection at the interfacesof the transmission lines and to ensure proper power delivery.

In some embodiments, circuitry 300 further includes a fourth capacitor308 electrically connected between the first electrode 101 and a currentamplifier 310, and further connected to a ground 309. Fourth capacitor308 can have slightly different requirements from the other capacitors,such as the first and third capacitors 327, 305. For example, the fourthcapacitor's 305 function can be to anchor the source output to ground athigh frequencies, filtering out all high frequency near the device's 301output and reducing reflections to the detector. Fourth capacitor 308should have negligible impedance in the frequency range of interest(e.g., the frequency range of device 301) but the impedance ought to bethe lowest compared to the sample/graphene 103 and the input of thecurrent preamplifier 310, which can have an impedance of 20Ω in thesensitivity setting commonly used, e.g., 1 μA per Volt, in its output.In some embodiments, the current amplifier 310 can be a low-noisecurrent preamplifier from DL Instruments, e.g., model 1211, and can becapable of measuring currents as low as 10 pA. The first currentamplifier 310 can be electrically connected to a second currentamplifier 321 which can be a lock-in amplifier and further can beconnected to ground 322 and is capable of providing an output reading ofthe vibration frequency of the high-transconductance layer 103. Thelock-in amplifier 321 can be a Stanford Research Systems model SR830,and further can be capable of measuring low voltages coming from thecurrent preamplifier 310, and also supplying a detection frequency ashigh as, e.g., 100 kHz.

Circuitry 300 can further include frequency mixer 320 for mixing thefrequency of from HF voltage source 302 and second capacitor 319, whichis electrically connected between frequency mixer 320 and the third(gate) electrode 106. The frequency mixer 320 can be, e.g., a modelZFM-3H from Mini-Circuits®, and can be capable of operating between50-300 kHz. In one embodiment, the frequency mixer 320 can be used togenerate sidebands by multiplying the HF signal with the detectionsignal reference. The result is the frequencies f+/−df. The purecomponent df at the reference signal frequency is generated by thedevice 301 after multiplying the frequencies f and f+/−df, along withother high frequency components. Further, the second capacitor 319 canhave any appropriate capacitance depending on the particular applicationof the fabricated device, and in one exemplary embodiment, has the samecharacteristics as capacitors 305, 312, and 327.

In some embodiments, circuitry 300 can further include a fifth capacitor312 electrically connected between second voltage source 317 (V_(g)) andthe third (gate) electrode 106 and further connected, in series, to afourth resistor 313 and a ground 314. The fifth capacitor 312 can haveany appropriate capacitance depending on the particular application ofthe fabricated device, and in one exemplary embodiment, has the samecharacteristics as capacitors 305, 319, and 327. Further, the fourthresistor 313 can have any appropriate resistance depending on theparticular application of the fabricated device, for example, 1-100Ω inone exemplary embodiment. In one embodiment, the resistance of thefourth resistor 313 matches that of resistors 304 and 306, e.g., 50Ω.Circuitry 300 also includes a third (e.g., gate) voltage source 317(V_(g)) which is electrically connected between the first capacitor 319and the third (gate) electrode 106 and can further be connected to aground 318. In some embodiments, gate voltage source 317 (V_(g)) canprovide an AC source or a DC source depending on the particularapplication, and in a embodiment gate voltage source 317 (V_(g))provides a DC source as illustrated in FIG. 3. In some embodiments, gatevoltage source 317 (V_(g)) can further be electrically connected to afifth resistor 316 and second inductor 315. The fifth resistor 316 canhave any appropriate resistance depending on the particular applicationof the fabricated device, for example, 1-100Ω in one exemplaryembodiment. In one embodiment, the resistance of the fifth resistor 316can have a resistance that corresponds to the resistance of the DCvoltage source 317 (V_(g)), which in some embodiments can be negligiblecompared to any resistance that comes after the series, such that thevoltage at the output is constant. The second inductor 315 can have anyappropriate inductance depending on the particular application of thefabricated device, for example, 1 mH in one exemplary embodiment, andcan further be determined similar to the first inductor 323, discussedabove. Further as illustrated in FIG. 3, the high-transconductance layer103 and gate electrode 106 can have a capacitance of C_(g), which issome embodiments can be estimated from the capacitance of aparallel-plate capacitor,

${C_{g} = {k\; ɛ_{0}\frac{A}{d}}},$

where k is the effective dielectric constant between thematerial/graphene 103 and the substrate 107, ε_(o) is the dielectricpermittivity of vacuum (equal to 8.85×10⁻¹² F/m, A is the area of thesample over the substrate, and d is the distance between the two planes.For a 1 micron square sheet in vacuum, with d=300 nm (typical thicknessof oxide removed in one embodiment), with k=1 for air/vacuum, thenC_(g)=30 aF, where a=atto=10⁻¹⁸.

FIG. 4 illustrates a method 400 for fabricating a device in accordancewith the disclosed subject matter. Method 400 includes forming 410 asubstrate, e.g., a silicon substrate, which can be performed by anytechnique known in the art, e.g., a float-zone technique as is known inthe art to produce high-resistivity silicon wafers. Further, method 400can also include depositing 420 a third electrode on the substrate. Thethird electrode can be deposited 420 by any technique known in the art,such as electron beam lithography, chemical vapor deposition, etc.,depending on the material used for the third electrode. Further, thethird electrode can include, for example, gold or gold layered ontoanother metal for adhesive purpose, e.g., chromium. Metals such asaluminum, copper, titanium or other metals appropriate for use in thesemiconductor arts can also be used, as can non-metal conductingsubstances.

In some embodiments, depositing 420 a third electrode can includesubmerging the third electrode completely beneath, or partially into,the surface of the substrate. In other exemplary embodiments, the thirdelectrode can be deposited 420 across the entire, or substantially allof the, substrate surface. In yet other embodiments where the substrateincludes at least a partially conducting material, e.g., silicon,depositing 420 the third electrode can be omitted all together and thesubstrate itself can serve as the third electrode. However, even inthose embodiments where the substrate includes at least a partiallyconducting material, e.g., silicon, the third electrode can still bedeposited 420 in a localized manner, e.g., only in the area where theintended device is to be located (a local gate electrode), or across theentire substrate surface to form a global gate electrode.

In some embodiments, depositing 420 the third electrode can be performedafter a first deposition 430 of a first layer of etchable material. Inother embodiments, the third electrode can be deposited 420 afterdeposition 470, 480 of the first and second electrodes and an additionaldeposition of to the etchant, discussed in more detail below and withreference to FIGS. 6( a)-(f). In addition, some embodiments alsoenvision patterning 425 the third electrode to a desired shape dependingon the particular application for the fabricated electromechanicaldevice, as discussed in more detail above. The third electrode can bepatterned 425 utilizing any technique known in the art, e.g., anylithography technique, to create the desired shape. In one exemplaryembodiment, the third electrodes can be deposited 420 and 425 in oneprocess, e.g., utilizing electron beam lithography.

As illustrated in FIG. 4, an etchable material is deposited 430 on thesurface of the substrate base. In some embodiments, the substrate of thefabricated device can include one or more layers of etchable materialthat are completely removed by the exposure 490 of the surface to anetchant, as is discussed in further detail below with reference to FIGS.5( a)-(f). In those embodiments where the first electrode is deposited420 across the entire, or substantially all of, the surface of thesubstrate, the etchable material can be deposited 430 substantially orentirely on the surface of the third electrode, while in thoseembodiments where the third electrode is deposited 420 locally, theetchable material can be deposited 430 on the third electrode and thesurface of the substrate (which itself can include a layer of etchablematerial previously deposited 430). Similarly, in those embodimentswhere the third electrode is completely submerged 420 in the substratesurface, the etchable material will be deposited entirely on thesubstrate surface.

In some exemplary embodiments, method 400 can further include forming440 at least one layer of graphene. In other embodiments, the at leastone layer of graphene can be acquired pre-formed. In those embodimentsincluding forming 440 the at least one layer of graphene, it can beformed 440 by any technique known in the art, such as mechanicalexfoliation, e.g., using adhesive tape to remove graphene flakes from astock of graphite. Other techniques include chemical exfoliation ofgraphene, whereby a stock of graphite is chemically dissolved intoindividual layers or even small stacks of monolayers, then spread ontothe etehable surface and dried. Also a chemical vapor depositiontechnique can be employed wherein graphene layers are grown onto metals,such as nickel or copper, and then the metals are chemically dissolvedand the graphene layers can be transferred to the etchable surface.

Method 400 further includes depositing 450 one or more layers ofgraphene onto the surface of the etchable material. In some exemplaryembodiments, this can be accomplished during the formation 440 of theone or more layers of graphene. For example, the chemical exfoliationtechnique envisions spreading, or spraying, the dissolved graphene ontothe surface of the etchable material, which will accomplish depositing450 the graphene layers as well. Similarly, a chemical vapor depositiontechnique also envisions transferring 450 the one or more layers ofgraphene to the etchable surface after chemically dissolving theelectrodes the graphene was formed 440 on. The graphene can bemechanically deposited 450 onto the surface of the etchable materialutilizing, for example, an adhesive tape or the like.

The method 400 further includes patterning 460 the graphene layers intodesired shapes, useful for particular applications, e.g.,nanoelectromechnical devices such as micro-mirrors and accelerometers,small switches, oscillators, resonators, etc. In some exemplaryembodiments, the graphene layers can be patterned 460 into nano-ribbonshaving widths of, e.g., 10-200 nm, and lengths of, e.g., 0.1-3 μm. Otherembodiments can have graphene layers patterned 460 into rectangularshapes having a width of 0.5-2 μm on each side, though larger and smallsizes are possible. The various upper and lower size limits for thegraphene flakes are discussed in more detail above. Patterning 460 thegraphene layers can be performed either before or after the deposition450 of the graphene layers onto the etchable surface. Further, thegraphene layers can be patterned 460 utilizing any appropriate techniqueknown in the art. For example, the graphene flakes can be patterned 460by oxygen plasma etching, e.g., for 6 seconds at 50 W and 200 mT, tocreate the required shapes for a given application. The graphene layerscan also be patterned 460 utilizing lithographic techniques, such asphotolithography or other kinds of lithography.

In some embodiments, method 400 further includes depositing 470 a firstelectrode on the etchable material such that at least a first portion ofthe at least one layer of graphene is covered by the first electrode andat least a portion of the first electrode is directly in contact withthe etchable material. The method also includes deposition 480 a secondelectrode on the etchable material such that at least a second portionof the at least one layer of graphene is covered by the second electrodeand at least a portion of the second electrode is directly in contactwith the etchable material. In one exemplary embodiment, the first andsecond electrodes can be deposited utilizing techniques well known inthe art, such as metal evaporation, e.g., in a vacuum utilizing anelectron-beam assist or thermal assist, or sputtering, orelectro-deposition. Further, the first or second electrodes can include,for example, gold or gold layered onto another metal for adhesivepurpose, e.g., chromium. Metals such as aluminum, copper, titanium orother metals appropriate for use in the semiconductor arts can also beused, as can non-metal conducting substances.

In an exemplary embodiment, the first and second electrodes can bepatterned 475, 485 into appropriate shapes for the particularapplication. Importantly, the first and second electrodes should not betouching and further each should be deposited 470, 480 and/or patterned475, 485 such that the first and second electrodes each cover at least aportion of the graphene layer, respectively. In addition, the first andsecond electrodes should be deposited 470, 480 and/or patterned 475, 485such that at least a portion of each is directly in contact with theetchable material surface, e.g., the silicon dioxide. Such aconfiguration will ensure that some etchable material, e.g., silicondioxide, remains un-etched beneath the portions of the first and secondelectrodes directly in contact with the silicon dioxide, thus formingthe first and second support structures, respectively, that will supportthe first and second electrodes above the substrate, e.g., the siliconor silicon dioxide layered on silicon. The unique feature of graphenethat permits etching to occur beneath the graphene layers can thenresult in a layer of graphene that is suspended above the substrate.Such resulting configuration is additionally due to the fact that thegraphene will adhere to the underside of the first and second electrodesdue to van der Waals force.

Method 400 further includes exposing 490 the etchable material to anetchant, for example, hydrofluoric acid, to remove the etchable materialaround the first and second layers of metal and underneath the at leastone layer of graphene, thereby fabricating an electromechanical devicehaving at least one layer of graphene suspended above the substrate. Theetching 490 can be performed utilizing any known technique in the art,such as vapor phase etching or liquid etching using a buffered oxideetchant which, in one embodiment, can be diluted in water (e.g., at a50:1 ratio of water to etchant). The etching 490 technique employed willdetermine the rate that the etchable material is removed. For example avapor phase etching technique utilizing hydrofluoric acid can removesilicon oxide at a rate of about 1 nm/min if the silicon oxide surfaceis heated to 60° C. A buffered oxide etching technique can, for example,remove silicon oxide at a rate of about 10 nm/min by exposing 490 thesurface to a solution of hydrofluoric acid diluted in water to a ratioof 50:1.

In some embodiments, a second layer of etchable material can bedeposited 430 on top of the first and second electrodes and prior to thedeposition 420 of the third electrode. The third electrode can then bedeposited 420 on top of the second layer of etchable material, whichitself is layered on top of the first and second electrodes and the atleast one layer of graphene. In such an embodiment, the third electrodecan be deposited 420 substantially over the at least one layer ofgraphene, but must have at least a portion that is not directly over thegraphene layer to serve as a supporting member after exposure 490 of thedevice to an etchant. The entire device can then be exposed 490 to anetchant to remove some portions of the etchable material, except thoseportions in direct contact with the first, second or third electrodesand not also in contact with the at least one layer of graphene. Oneexemplary embodiment having such a configuration is discussed in moredetail below with reference to FIGS. 6( a)-(f).

FIGS. 5( a)-(f) illustrate an exemplary process for fabricating anelectromechanical device 500 having a localized gate electrode locatedbelow a suspended layer of graphene in accordance with the disclosedsubject matter. As illustrated in FIG. 5( a), a substrate base 501 isformed 410 and a first layer of etchable material 502 is deposited 430thereon. In one exemplary embodiment the substrate base 501 is composedof high resistivity silicon and the first layer of etchable material 502is composed of silicon dioxide, though those skilled in the art willunderstand other materials can be utilized. FIG. 5( b) illustrates thedeposition 420 of the third electrode (e.g., the gate electrode) 106onto the surface of the first layer of etchable material 502. In oneexemplary embodiment, the gate electrode 106 is composed of gold and, inthe same or another embodiment can be deposited 420 using electron beamlithography, as is known in the art. Further, the gate electrode 106 canbe patterned 425 utilizing techniques known in the art, e.g.,lithography, and in some embodiments, depositing 420 and patterning 425the third (gate) electrode 106 can be performed in one process, e.g.,utilizing electron beam lithography.

FIG. 5( c) illustrates the deposition 430 of a second layer of etchablematerial 503 on top of the first layer 502 and the third electrode 106.In one exemplary embodiment, the second layer of etchable material 503is composed of silicon dioxide, though those skilled in the art willunderstand other materials suitable for etching can be employed. FIG. 5(d) illustrates the deposition 450 of at least one layer ofhigh-transconductance material (e.g., graphene) 103 on the surface ofthe second layer of etchable material 503.

FIG. 5( e) illustrates the deposition 460, 470 of the first and secondelectrodes 101, 104. In some embodiments, the first and secondelectrodes 101, 104 can be deposited 460, 470 utilizing any techniqueknown in the art, such as electron beam lithography. Further, the firstand second electrodes 101, 104 can be patterned 465, 475 utilizing anytechnique known in the art, e.g., any lithography technique, to createthe desired shape of the first and second electrodes 101, 104. In oneexemplary embodiment, the first and second electrodes 101, 104 can bedeposited 460, 470 and 465, 475 in one process, e.g., utilizing electronbeam lithography. The first and second electrodes 101, 104 can also beformed from any substance suitable for use as an electrode, such asgold, aluminum, copper, titanium, etc. FIG. 5( e) further illustratesthat the first and second electrodes 101, 104 are deposited 460, 470and/or patterned 465, 475 such that each covers at least a portion 103 aof the graphene layer 103 and also such that at least a portion 101 a,104 a of each electrode 101, 104 is in contact with the etchable layer503.

FIG. 5( f) illustrates a fabricated electromechanical device 500 afterexposure 490 to an etchant, e.g., hydrofluoric acid. As illustrated inFIG. 5( f), the etchant etched away the exposed portions of the secondlayer of etchable material 503 such that the third electrode 106 wasuncovered and the etchant further removed the second layer of etchablematerial 503 underneath the graphene layer 103, including those portions103 a of the graphene layer 103 covered by the first and secondelectrodes 101, 104, thus resulting in a layer of graphene 103 suspendedabove the substrate 107, which as illustrated in FIG. 5( f) includes thesubstrate base layer (e.g., the silicon layer) 501 and the first layerof etchable material (e.g., the first silicon dioxide layer) 502.Further illustrated in FIG. 5( f) are the support members 102, 105,which have been formed, in this exemplary embodiment, from the secondlayer of etchable material (e.g., the second silicon dioxide layer) 503at the portions 101 a, 104 a of that layer 503 that were directlycovered electrodes 101, 104. Such a result is due to the fact that theetchant will not diffuse beneath the electrodes 101, 104, while it willdiffuse beneath the graphene layer 103.

FIG. 5( g) is an image of a series of fabricated devices 500 havingfirst and second electrodes 101, 104 and local gate electrodes 106located between the first and second electrodes 101, 104 and beneathsuspended graphene layers 103 (not visible).

FIGS. 6( a)-(f) illustrate an exemplary process for fabricating anelectromechanical device 600 having a localized gate electrode suspendedabove a suspended layer of graphene in accordance with the disclosedsubject matter. As illustrated in FIG. 6( a), a substrate base 501 isformed 410 and a first layer of etchable material 502 is deposited 430thereon. In one exemplary embodiment the substrate base 501 is composedof high resistivity silicon and the first layer of etchable material 502is composed of silicon dioxide, though those skilled in the art willunderstand other materials can be utilized.

FIG. 6( b) illustrates the deposition 450 of at least one layer ofhigh-transconductance material (e.g., graphene) 103 on the surface ofthe first layer of etchable material 502.

FIG. 6( c) illustrates the deposition 460, 470 of the first and secondelectrodes 101, 104. In some embodiments, the first and secondelectrodes 101, 104 can be deposited 460, 470 utilizing any techniqueknown in the art, such as electron beam lithography. Further, the firstand second electrodes 101, 104 can be patterned 465, 475 utilizing anytechnique known in the art, e.g., any lithography technique, to createthe desired shape of the first and second electrodes 101, 104. In oneexemplary embodiment, the first and second electrodes 101, 104 can bedeposited 460, 470 and 465, 475 in one process, e.g., utilizing electronbeam lithography. The first and second electrodes 101, 104 can also beformed from any substance suitable for use as an electrode, such asgold, aluminum, copper, titanium, etc., as well as conductingnon-metallic substances. FIG. 6( c) further illustrates that the firstand second electrodes 101, 104 are deposited 460, 470 and/or patterned465, 475 such that each covers at least a portion 103 a of the graphenelayer 103 and also such that at least a portion 101 a, 104 a of eachelectrode 101, 104 is in contact with the first etchable layer 502.

FIG. 6( d) illustrates the deposition 430 of a second layer of etchablematerial 503 on top of the first layer 502 and the first and secondelectrode 101, 104 and the at least one layer of graphene 103. In oneexemplary embodiment, the second layer of etchable material 503 iscomposed of silicon dioxide, though those skilled in the art willunderstand other materials suitable for etching can be employed.

FIG. 6( e) illustrates the deposition 420 of the third electrode (e.g.,the gate electrode) 106 onto the surface of the second layer of etchablematerial 503. In one exemplary embodiment, the gate electrode 106 iscomposed of gold and, in the same or another embodiment can be deposited420 using electron beam lithography, as is known in the art. The thirdelectrode 106 can also be formed from any substance suitable for use asan electrode, such as gold, aluminum, copper, titanium, etc., as well asconducting non-metallic substances. Further, the gate electrode 106 canbe patterned 425 utilizing techniques known in the art, e.g.,lithography, and in some embodiments, depositing 420 and patterning 425the third (gate) electrode 106 can be performed in one process, e.g.,utilizing electron beam lithography. FIG. 6( e) further illustrates thatthe third electrode 106 is deposited 420 such that one or more portions106 a are not directly above the at least one layer of graphene 103.Such a configuration, as noted above, can ensure that, after exposure490 to an etchant that removes the etchable material from the first andsecond layers 502, 503 above and below the layer of graphene 103, atleast some portion of the first and second layers 502, 503 remains toform at least one support member 108 to support the third electrode 106.

FIG. 6( f) illustrates a fabricated electromechanical device 600 afterexposure 490 to an etchant, e.g., hydrofluoric acid. As illustrated inFIG. 6( f), the etchant etched away the exposed portions of the secondlayers of etchable material 503 such that the third electrode 106 wassuspended above the graphene layer 103 and supported by supportingmembers 108, which was formed from the first and second layers 502, 503of the etchant material directly below portions 106 a. The etchantfurther removed the first layer of etchable material 502 underneath thegraphene layer 103, including those portions 103 a of the graphene layer103 covered by the first and second electrodes 101, 104, thus resultingin a layer of graphene 103 suspended above the substrate 107, which asillustrated in FIG. 6( f) includes the substrate base layer (e.g., thesilicon layer) 501. Further illustrated in FIG. 6( f) are the supportmembers 102, 105, which have been formed, in this exemplary embodiment,from the first layer of etchable material (e.g., the first silicondioxide layer) 502 at the portions 101 a, 104 a of that layer 502 thatwere directly covered electrodes 101, 104. Such a result is due to thefact that the etchant will not diffuse beneath the electrodes 101, 104,106 while it will diffuse beneath the graphene layer 103.

FIG. 6( g) is an side view scanning electron microscope image of afabricated device 600 having first and second electrodes 101, 104 andlocal gate electrodes 106 located between the first and secondelectrodes 101, 104 and suspended above the suspended graphene layers103. FIG. 6( h) is a top view image of the device in FIG. 6( g).

FIGS. 7( a)-(d) illustrate an exemplary process for fabricating anelectromechanical device 700 having a global gate electrodeconfiguration in accordance with the disclosed subject matter. Asillustrated in FIG. 7( a), a substrate base 501 is formed 410 and afirst layer of etchable material 502 is deposited 430 thereon. In oneexemplary embodiment the substrate base 501 is composed of highresistivity silicon and the first layer of etchable material 502 iscomposed of silicon dioxide, though those skilled in the art willunderstand other materials can be utilized. FIG. 7( b) illustrates thedeposition 450 of at least one layer of high-transconductance material(e.g., graphene) 103 on the surface of the first layer of etchablematerial 502. FIG. 7( c) illustrates the deposition 460, 470 of thefirst and second electrodes 101, 104, which can also be patterned 465,475 as discussed above with reference to FIG. 6( c). FIG. 7( d)illustrate an exemplary fabricated device 700 which includes at leastone suspended layer of graphene 103 and where the silicon substrate 501functions as global gate electrode.

FIG. 7( e) is a top-view image of a series of fabricatedelectromechanical devices 700 having global gate electrodes. FIG. 7( f)is a side-view scanning electron microscope image of the fabricatedelectromechanical device located at point A in FIG. 7( e). As shown inFIG. 7( f), device 700 includes first and second electrodes 101, 104, asuspended graphene nano-ribbon 106 having dimensions 150 nm wide andapproximately 1.7 μm long and a global gate electrode 106/107 comprisingthe silicon substrate upon with the device 700 was formed. FIG. 7( g) isa side-view scanning electron microscope image of the fabricatedelectromechanical device located at point B in FIG. 7( e). As shown inFIG. 7( g), and similar to FIG. 7( f), device 700 includes first andsecond electrodes 101, 104, a suspended graphene nano-ribbon 106 havingdimensions 150 nm wide and approximately 1.7 μm long and a global gateelectrode 106/107 comprising the silicon substrate upon with the device700 was formed. FIG. 7( h) is a rendering of fabricated device 700illustrating first and second electrodes 101, 104 and graphene layer 103over the substrate 106/107 and further illustrating supporting members102, 105.

As has been illustrated above in connection with FIGS. 5-6 that graphenecan be suspended underneath the first and second electrodes.Alternatively, graphene can be laid on top of the first and secondelectrodes, as illustrated in FIG. 8( a). In this configuration, thecontact between the graphene and the two electrodes can be provided byshort-range attractive forces between the graphene and the electrodes,for example, van der Waals forces. To fabricate a device having thisconfiguration, the procedures described above in connection with FIGS.5-6 can be slightly modified. For example, instead of depositing thegraphene on the etchable material and then depositing the two electrodeson the etchable material and each covering a portion the graphene, thetwo electrodes 101 and 104 can be deposited on the etchable material 802(which has been deposited on the substrate 801), and then the graphene103 can be deposited on the top of the two electrodes to span the twoelectrodes. The third electrode 106 can be introduced by either of theprocedures described in connection with FIGS. 5-6. FIGS. 8( b) and 8(c)depict SEM micrographs of a device according to the embodimentillustrated in FIG. 8( a).

It will be understood that the foregoing is only illustrative of theprinciples described herein, and that various modifications can be madeby those skilled in the art without departing from the scope and spiritof the disclosed subject matter. For example, the methods describedherein are used for fabricating electromechanical devices utilizinggraphene. It is understood that that techniques described herein areuseful for fabricating electromechanical devices with otherhigh-transconductance materials. Moreover, features of embodimentsdescribed herein can be combined and/or rearranged to create newembodiments.

1. A method for fabricating an electromechanical device comprising:depositing a first layer of etchable material on a substrate; depositingat least one layer of graphene on the etchable material; depositing afirst electrode on the etchable material such that at least a firstportion of the at least one layer of graphene is covered by the firstelectrode and at least a portion of the first electrode is directly incontact with the etchable material; depositing a second electrode on theetchable material such that at least a second portion of the at leastone layer of graphene is covered by the second electrode and at least aportion of the second electrode is directly in contact with the etchablematerial; and exposing the etchable material to an etchant to remove theetchable material around the first and second electrodes and underneaththe at least one layer of graphene, thereby fabricating a device havingthe at least one layer of graphene suspended above the substrate.
 2. Themethod of claim 1, further comprising depositing a third electrode onthe substrate.
 3. The method of claim 2, wherein depositing the thirdelectrode on the substrate comprises depositing the third electrode onthe first layer of etchable material.
 4. The method of claim 1, furthercomprising depositing a second layer of etchable material on thesubstrate.
 5. The method of claim 4, further comprising: depositing athird electrode on the first layer of etchable material, whereindepositing the second layer of etchable material on the substratecomprises depositing the second layer of etchable material on the firstlayer of etchable material, wherein depositing the at least one layer ofgraphene on the etchable material comprises depositing the at least onelayer of graphene on the second layer of etchable material, whereindepositing the first electrode on the etchable material comprisesdepositing the first electrode on the second layer of etchable material,and wherein depositing the second electrode on the etchable materialcomprises depositing the second electrode on the second layer ofetchable material.
 6. The method of claim 4, further comprising:depositing a third electrode on the second layer of etchable material,wherein depositing the at least one layer of graphene on the etchablematerial comprises depositing the at least one layer of graphene on thefirst layer of etchable material, wherein depositing the first electrodeon the etchable material comprises depositing the first electrode on thefirst layer of etchable material, wherein depositing the secondelectrode on the etchable material comprises depositing the secondelectrode on the first layer of etchable material, and whereindepositing the second layer of etchable material on the substratecomprises depositing the second layer of etchable material on the firstlayer of etchable material.
 7. The method of claim 1, further comprisingpatterning the at least one layer of graphene.
 8. The method of claim 7,wherein patterning the at least one layer of graphene comprisesutilizing lithography to pattern the deposited layer.
 9. The method ofclaim 7, wherein patterning the at least one layer of graphene comprisesutilizing oxygen plasma etching to pattern the at least one layer ofgraphene.
 10. The method of claim 1, wherein exposing the etchablematerial to an etchant comprises acid vapor phase etching the etchablematerial.
 11. The method of claim 1, wherein exposing the etchablematerial to an etchant comprises exposing the etchable material to abuffered oxide etchant.
 12. A method for fabricating anelectromechanical device comprising: depositing a first layer ofetchable material on a substrate; depositing a first electrode on theetchable material; depositing a second electrode on the etchablematerial; exposing the etchable material to an etchant to remove theetchable material around the first electrode and the second electrode;and depositing at least one layer of graphene to span the firstelectrode and the second electrode such that at least a first portion ofthe graphene is in contact with the first electrode and at least asecond portion of the graphene is in contact with the second electrode,and the graphene is electrically separate from the substrate.
 13. Themethod of claim 12, further comprising depositing a second layer ofetchable material on the substrate.
 14. The method of claim 13, furthercomprising: depositing a third electrode on the first layer of etchablematerial, wherein depositing the second layer of etchable material onthe substrate comprises depositing the second layer of etchable materialon the first layer of etchable material, wherein depositing the firstelectrode on the etchable material comprises depositing the firstelectrode on the second layer of etchable material, and whereindepositing the second electrode on the etchable material comprisesdepositing the second electrode on the second layer of etchablematerial.